Pulsed Laser Deposition

A method for fabricating thin films on substrates by evaporating materials with Laser pulses.

Within an ultrahigh vacuum chamber, a solid (typically ceramic) target is illuminated with short high-energy laser pulses, which ablate some material via thermal or non-thermal processes. The ablated material is deposited on a substrate as a thin film of amorphous or crystalline material. The number of laser Pulses is adjusted to obtain the required material thickness.

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